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InfrastructureSEM system - Electron lithography e-beam and scanning electron microscope


SEM system:

Electron lithography e-beam and scanning electron microscope

scanning electron microscopy SEM

Model EVO-50 (Carl Zeiss). Used for surface characterization of the samples. Equiped with a electrom beam litography module (Elphy Plus by Raith). It is also used to produce nanopatterns onto thin films.

Main specifications:

  • Resolution: up to 3.0 nm (using W) and 2.0 nm (using LaB6)
  • Voltage: 0.2 to 30 KV
  • Magnification: 5x - 106x
  • Chamber: 365 mm (diam.) x 255 mm (h)
  • Sample holder movement (5 axis):
    • X=100 mm (+50 mm, -50 mm)
    • Y= 125 mm (+65 mm, -60 mm)
    • Z = 55 mm
    • T = 0º - 90º
    • R = 360º
  • Image processing: Resolution up to 3072 x 2304 pixel; screen images 1024 x 768 pixel; control system SmartSEM under Windows XP
  • Electron litography module: Elphy Plus by Raith.


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Page last modified on February 20, 2018, at 08:15 PM.